I-Sputtering.PVD
1. I-Magnetron sputtering coating ingcono kakhulu kune-arc ion coating, futhi kunezinhlayiya zamaconsi amaholoholo amancane.
2. Amandla okubopha ifilimu-substrate angcono kune-vacuum evaporation coating. Kubuchwepheshe be-vacuum evaporation coating, amandla ama-athomu kungqimba lwefilimu kuphela amandla okushisa athathwa ngesikhathi sokuhwamuka, okulingana no-00.1~0.2eV; kuyilapho ku-magnetron sputtering coating technology, amandla ezinhlayiya zesendlalelo sefilimu akhiqizwa ama-argon ion nama-athomu angaphezulu okuhlosiwe. Ukushintshisana nokushintshana komfutho kungathuthukisa amandla okubopha isisekelo se-membrane.
3. Ukwakheka kwesendlalelo sefilimu kuseduze nezinto ezihlosiwe. Ungqimba lwefilimu lwe-magnetron sputtering luchithwa kusukela ekuhlosweni ngama-argon ions, futhi ukwakheka kwesendlalelo sefilimu kusondelene kakhulu nalokho okuhlosiwe. Umphumela othi "i-fractionation" noma "ukonakala" ulula uma uqhathaniswa ne-evaporation plating. Kodwa-ke, ngokuvamile lapho umboza ifilimu esebenzayo enezidingo eziqinile zokusebenza, inani elithile legesi elisebenzayo kufanele lengezwe ngesikhathi senqubo yokufafaza ukuze kwenziwe ukwakheka kwefilimu eyinhlanganisela yefilimu kuhlangabezane nesilinganiso se-stoichiometric ukuze kuqinisekiswe izidingo zokusebenza kwefilimu.
4. I-coating inokusebenza okuhle kokugqoka. Ingcindezi ye-vacuum ye-sputtering coating iphansi. Umzila wamahhala wama-molecule egesi mfushane, amathuba okushayisana aphakeme, futhi uma kuqhathaniswa nokuhwamuka kwe-evaporation, ikhono lokuhlakaza lezinhlayiya zefilimu linamandla, ukusebenza kokumboza kuhle, futhi ukujiya kwefilimu kufana.
5. I-Sputtering target iwumthombo wohlobo lwendawo. Ubude bakho bobabili indiza Magnetron sputtering target kanye cylindrical magnetron target bungafinyelela 300~3000 mm. Nakuba kokubili kuyimithombo yomugqa enamathelayo, ehambisana nokunyakaza okuqhubekayo kwe-workpiece, ingambozwa endaweni enkulu yezingxenye. Uma ifilimu imbozwe endaweni engilazi enobubanzi obungu-3300mm, ungqimba lwefilimu olufana nemibala ehlukahlukene kanye nokudluliswa kungatholakala. I-Magnetron sputtering isetshenziswe kabanzi ekufakeni amafilimu amakhulu amancane.
6. Sebenzisa i-voltage ye-bias ku-workpiece. Ekuqaleni, kubuchwepheshe be-Magnetron sputtering. Namuhla, ubuchwepheshe be-magnetron sputtering coating busetshenziswa kakhulu kuma-substrates ensimbi, futhi ukusebenzisa i-voltage engathathi hlangothi engalungile endaweni yokusebenza ukuze kuthuthukiswe ikhwalithi yesendlalelo sefilimu sekuphenduke ubuchwepheshe obujwayelekile bokumboza amafilimu asebenzayo akhethekile kanye nemikhiqizo yokuhlobisa ephezulu.
