Etching
Imigaqo esisiseko ye-etching eyomileyo
1. Ukusabela kwerhasi**: Kwi-etching eyomileyo, iigesi ezifana nefluoride kunye nekloridi zidla ngokusetyenziswa njengeetchants. Ezi gesi zisabela kunye nezinto eziza kufakwa kwimeko yeplasma ukuze zenze izinto eziguqukayo.
2. Ukuveliswa kwePlasma**: Irhasi iguqulwa ibe yiplasma kusetyenziswa irediyo frequency (RF) excitation okanye i-microwave excitation. Kwi-plasma, iimolekyuli zegesi zi-ionized ukuvelisa i-radicals yamahhala kunye ne-ion, ezinokusabela ngokufanelekileyo kunye nezinto eziphathekayo.
3. I-etching ekhethiweyo**: I-etching eyomileyo inokufikelela ekukhetheni okuphezulu kwaye inokususa ngokukhetha izinto ezithile ngelixa ushiya ezinye izinto ezingatshintshiyo. Oku kubaluleke kakhulu ekuqhutyweni kwezakhiwo ezinzima.
Ukusetyenziswa kwe-etching eyomileyo
- Ukwenziwa kweSemiconductor: Isetyenziselwa ukuhanjiswa kwepateni kwii-silicon wafers ukwenza iisekethe.
- Ukwenziwa kwe-MEMS: Ukusetyenzwa kolwakhiwo lweenkqubo zemicroelectromechanical.
-I-Optoelectronics: Ukuvelisa amacandelo e-optoelectronic afana ne-lasers kunye ne-detectors.
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