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High-Performance Multi-Chamber Roll-to-Roll Coating Machine from China Suppliers & Factory for Complex Film Coating

Introducing our advanced roll-to-roll coating equipment, expertly designed for high-performance multi-layer product coating and high-speed applications. This state-of-the-art system is available in configurations featuring single roller multiple chambers or double roller multiple chambers. The single roller option accommodates up to 12 cathode installations across 6 target positions, while the double roller setup allows for a maximum of 24 cathodes across 12 target positions. Our equipment excels at producing complex multi-layer films or thick film coatings, making it an ideal choice for manufacturers seeking top-tier solutions. As a leading China supplier and factory, we are committed to delivering superior quality and performance in our coating technology

Machine Brief Description

It is a continuous roll-to-roll coating equipment which specially developed for high performance multiple layers products coating or high speed coating. There are single roller multiple chambers or double rollers multiple chambers. The single roller multiple chambers equipped with 6 cathode target positions, up to install 12 pieces cathodes. The double rollers multiple chambers can have 12 cathodes target positions, up to install 24 pieces cathodes. It can achieve multiple layers complex film or thick film coating. The multi-chamber vacuum sputtering roll-to-roll coating machine with more target positions. Its innovative features not only improve production efficiency but also ensure high-quality output, making it an essential tool for modern manufacturing processes.

Product Features

The machine can be equipped with planar or rotating sputtering cathode according different customer requirement.
Can be configured with rotating or flat sputtering cathode.
It can be equipped with DC or MF power supply used for reactive sputtering.
Double-roller multi-chamber equipment can be up to 12 target positions, max can be installed 24 cathodes, that can realize higher efficiency.
The coating chamber is well partitioned, which is suitable for multi layer coating process.
Large production capacity, strong stability, good repeatability and low operation cost.

Technical Parameter

Serial	JRC
Technology	Sputtering Technology
Chamber size	Can be designed upon different request
Substrate Material	PET, BOPP, PEN, PI, PC, PE, and other organic films. Fiber cloth, tissue roll, foam, metal rolling material, flexible material such as ultra-thin glass
Coating film	Cu, Ag, Cr, Ni, Au, Mo, Si, ITO
Application	Lithium battery composite copper foil, FCCL (flexible copper clad laminate), Transparent conductive cloth, Electromagnetic shielding film, Solar cell absorption layer, electrode layer, Barrier film, heat dissipation film, high reflective film

Frequently Asked Questions

What is the primary application of the JRC Roll-to-Roll Sputtering Coater?

This equipment is widely used for manufacturing lithium battery composite copper foil, FCCL (flexible copper clad laminate), transparent conductive cloth, electromagnetic shielding films, solar cell absorption and electrode layers, barrier films, heat dissipation films, and high reflective films.

Which substrate materials are compatible with this equipment?

It supports a wide range of flexible materials including PET, BOPP, PEN, PI, PC, PE, and other organic films, as well as fiber cloth, tissue rolls, foam, metal rolling materials, and ultra-thin glass.

How many cathodes can be installed in this machine?

The single roller multiple chambers configuration accommodates up to 12 cathodes (6 target positions), while the double rollers multiple chambers configuration can support up to 24 cathodes (12 target positions) for high-efficiency production.

What types of films can be coated using this sputtering machine?

The machine is capable of coating various thin films including Copper (Cu), Silver (Ag), Chromium (Cr), Nickel (Ni), Gold (Au), Molybdenum (Mo), Silicon (Si), and Indium Tin Oxide (ITO).

Can the chamber size be customized to meet specific requirements?

Yes, the chamber size is fully customizable and can be custom-designed based on the specific application demands and production requirements of the customer.

What power supplies are compatible with the sputtering cathodes?

The system can be configured with either DC (Direct Current) or MF (Medium Frequency) power supplies to support reactive sputtering coating processes.