Etching
Ka'idodin asali na bushe etching
1. Gas reaction**: A bushe etching, yawanci ana amfani da iskar gas kamar fluoride da chloride a matsayin etchant. Waɗannan iskar gas suna amsawa tare da kayan da za a ƙirƙira a cikin yanayin plasma don samar da samfuran da ba su da ƙarfi.
2. Ƙirƙirar Plasma ***: Ana canza iskar gas zuwa plasma ta hanyar motsa jiki na mitar rediyo (RF) ko motsa jiki na microwave. A cikin plasma, ƙwayoyin iskar gas suna ionized don samar da radicals da ions kyauta, wanda zai iya yin tasiri sosai tare da kayan.
3. Zaɓaɓɓen etching ***: Dry etching na iya samun babban zaɓi kuma yana iya zaɓin cire takamaiman kayan yayin barin sauran kayan ba canzawa. Wannan yana da matukar mahimmanci don sarrafa sifofi masu rikitarwa.
Aikace-aikace na bushe etching
- Masana'antar Semiconductor: Ana amfani da shi don canja wurin tsari akan wafer siliki don ƙirƙirar da'irori.
- Masana'antar MEMS: Tsarin tsarin tsarin microelectromechanical.
- Optoelectronics: Kera kayan aikin optoelectronic kamar lasers da ganowa.
