China Suppliers Factory JRC Series Single Vacuum Chamber Sputtering Roll to Roll Coating Machine for Metallizing
Single vacuum chamber sputtering roll to roll coating machine
JRC series sputtering roll coater is a type of compact roll to roll vacuum metallizing machine, winding system and coating system installed in the same chamber, high degree of automation. The size can be designed according different width products.
Coats Cu, Ag, Cr, Ni, Au, Mo, Si, ITO, C, etc. conductive film.
Coats NiCr, NiCu, InSn, etc. alloy film.
Coats SiO2, Nb2O5, Al2O3, CrO, TiO2 film.
The machine can realize double-sided copper sputtering on the surface of PET/PP or other flexible material with a thickness of 3.0~4.5μm and a width of 600~1650mm at one time, with a "PVD copper-polymer support layer-PVD copper" sandwich structure, and the machine process speed is 0.5 -30m/min.
Product Features
- The machine can be equipped with planar or rotating sputtering cathode according different customer requirement.
- The machine can achieve single side or both sides coating on substrate surface depend on coating process of different products.
- The machine requires less area occupied, favourable in price, easy to operate.
- The metallized film is very stable and the film layer has good density. Large capacity and output.
Technical Parameter
| Serial | JRC |
|---|---|
| Technology | Microwave sputtering |
| Substrate Material | PET, BOPP, PEN, PI, PC, PE, and other organic films. Fiber cloth, tissue roll, foam, metal rolling material, flexible material such as ultra-thin glass |
| Coating film | Cu, Ag, Cr, Ni, Au, Mo, Si, ITO |
| Application | Lithium battery composite copper foil, FCCL (flexible copper clad laminate), Transparent conductive cloth, Electromagnetic shielding film, Solar cell absorption layer, electrode layer, Barrier film, heat dissipation film, high reflective film |
Frequently Asked Questions
What materials can the JRC series roll to roll coating machine deposit?
The machine can deposit a variety of films, including conductive films (Cu, Ag, Cr, Ni, Au, Mo, Si, ITO, C), alloy films (NiCr, NiCu, InSn), and metal oxide/dielectric films (SiO2, Nb2O5, Al2O3, CrO, TiO2).
What types of substrate materials are compatible with this machine?
It supports flexible substrates such as PET, BOPP, PEN, PI, PC, PE, organic films, fiber cloth, tissue rolls, foam, metal rolling materials, and ultra-thin flexible glass.
What are the primary industrial applications for this sputtering coater?
Key applications include lithium battery composite copper foil, FCCL (flexible copper clad laminate), transparent conductive cloth, electromagnetic shielding film, solar cell absorption and electrode layers, barrier films, heat dissipation films, and high reflective films.
Can the JRC series perform double-sided coating?
Yes, the machine can achieve single-sided or double-sided coating depending on the product process. It can realize double-sided copper sputtering on substrates like PET/PP in a single pass to create a "PVD copper-polymer support layer-PVD copper" sandwich structure.
What are the processing speed and substrate dimensions supported by the machine?
The machine supports substrate thicknesses of 3.0 to 4.5 μm, widths of 600 to 1650 mm, and operates at a process speed range of 0.5 to 30 m/min.
What cathode configurations are available for this system?
Depending on the specific customer and coating process requirements, the machine can be equipped with either planar or rotating sputtering cathodes.
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