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China Suppliers Factory Compact Roll to Roll Sputtering Vacuum Coating Machine for Metallizing Conductive Films

The JRC series sputtering roll coater is an advanced compact roll-to-roll vacuum metallizing machine, uniquely designed to integrate winding and coating systems within a single chamber for enhanced efficiency and automation. This innovative equipment can be customized to accommodate various product widths, making it ideal for diverse manufacturing needs, Key features include:, - Capability to deposit conductive films such as Cu, Ag, Cr, Ni, Au, Mo, Si, ITO, C, and more, - Ability to apply alloy films including NiCr, NiCu, InSn, and others, - Versatile coating options for dielectric films like SiO2, Nb2O5, Al2O3, CrO, and TiO2, As a leading factory in China, we are committed to providing high-quality sputtering roll coaters that meet the demands of modern industries. Our products are designed with precision, ensuring optimal performance and reliability. Partner with us, your trusted suppliers, to enhance your manufacturing capabilities with our state-of-the-art technology

Single Vacuum Chamber Sputtering Roll to Roll Coating Machine

The JRC series sputtering roll coater is a state-of-the-art, compact roll-to-roll vacuum metallizing machine. Built with efficiency in mind, both the winding system and the coating system are installed in the same single vacuum chamber, achieving a high degree of automation. The system footprint and dimensions can be custom-designed according to different product widths.

1. Conductive Films Deposits high-quality Cu, Ag, Cr, Ni, Au, Mo, Si, ITO, C, and other conductive materials.

2. Alloy Films Capable of sputtering NiCr, NiCu, InSn, and various other custom alloy thin films.

3. Oxide & Compound Films Deposits functional layers including SiO2, Nb2O5, Al2O3, CrO, and TiO2.

Process Capability Highlight: The machine is engineered to realize double-sided copper sputtering on the surface of PET/PP or other flexible materials (thickness: 3.0~4.5μm, width: 600~1650mm) in a single pass. It yields a premium "PVD copper - polymer support layer - PVD copper" sandwich structure at a processing line speed of 0.5 to 30 m/min.

Product Features

The machine can be equipped with either a planar or rotating sputtering cathode depending on specific customer and process requirements.
Supports versatile configuration options to achieve single-sided or double-sided coating on substrate surfaces based on product demands.
Features a compact design that occupies less floor area. It offers highly favorable pricing and is exceptionally easy to operate.
Delivers extremely stable coating performance and high-density film layers, ensuring large production capacity and high output.

Technical Parameters

Serial	JRC
Technology	Microwave sputtering
Substrate Material	PET, BOPP, PEN, PI, PC, PE, and other organic films. Fiber cloth, tissue roll, foam, metal rolling material, flexible material such as ultra-thin glass.
Coating Film	Cu, Ag, Cr, Ni, Au, Mo, Si, ITO
Application	• Lithium battery composite copper foil • FCCL (flexible copper clad laminate) • Transparent conductive cloth • Electromagnetic shielding film • Solar cell absorption layer, electrode layer • Barrier film, heat dissipation film, high reflective film

Frequently Asked Questions (FAQ)

What types of films can the JRC series sputtering roll coater deposit?

The machine is highly versatile and can coat conductive films (Cu, Ag, Cr, Ni, Au, Mo, Si, ITO, C), alloy films (NiCr, NiCu, InSn), and compound/oxide films (SiO2, Nb2O5, Al2O3, CrO, TiO2).

What substrates are compatible with this roll-to-roll system?

It supports a wide range of flexible substrates including organic films (PET, BOPP, PEN, PI, PC, PE), fiber cloth, tissue rolls, foam, metal rolling materials, and ultra-thin glass.

Can the machine perform double-sided copper coating?

Yes. The system is designed to achieve double-sided copper sputtering on substrates like PET or PP in a single pass, creating a "PVD copper - polymer support layer - PVD copper" sandwich structure.

What is the production speed of the coating process?

The process line speed of the machine ranges from 0.5 to 30 meters per minute, depending on the specific coating recipe and substrate requirements.

What are the main industrial applications for this technology?

Key applications include lithium battery composite copper foils, flexible copper clad laminates (FCCL), transparent conductive cloth, electromagnetic shielding films, solar cell absorption/electrode layers, and high-performance barrier or heat dissipation films.

What are the advantages of the single vacuum chamber design?

By integrating both the winding and coating systems inside a single chamber, the JRC series reduces floor space requirements, offers highly favorable pricing, simplifies operations, and maintains a highly automated, stable environment for high-density film deposition.