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China PECVD Roll to Roll Coating Machine | Top Suppliers & Factory Solutions for Advanced Coating Technology

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Machine Brief Description

JRP serial PECVD roll to roll coating machine is a roll to roll vacuum coating machine adopts plasma to enhanced chemical vapor deposition (PECVD) to deposit various films.

One of the outstanding features of the JRP series PECVD machines is its advanced plasma technology. Through an enhanced chemical vapor deposition process, it achieves optimal film properties, including improved adhesion, uniformity and density. The resulting film not only meets but exceeds industry standards, giving your product a competitive advantage.

A user-friendly interface and automated controls make operation seamless, allowing for quick adjustments and real-time monitoring of the coating process. Additionally, the machine is designed with energy efficiency in mind, reducing operating costs while minimizing environmental impact.

Key Features & Advantages

Stable in quality, large loading capacity.

Fast coating speed, good film uniformity and adhesion.

To form film on flexible rolling substrates by PECVD.

Optimized design, easy to operate and do maintenance.

It adopts flat or roller electrode, equipped with high voltage, MF or RF power supply.

Substrate width range from 350mm to 2050mm.

Low operating costs.

Technical Parameter

Serial	JRP
Technology	PECVD vacuum deposition
Chamber size	Coating chamber can be designed upon different request
Substrate Material	Organic thin film such as PET / BOPP / PEN / PI / PC / PE, Textile cloth, Leather, Flexible substrates such as metal foil;
Substrate width range	350mm - 2050mm
Coating film	High barrier film such as SiO2, Si3N4 or functional film such as DLC, C;
Vacuum system	Vacuum system select international famous brand or China famous brand molecular pumps (or diffusion pumps), polycold, mechanical pumps, etc.

Frequently Asked Questions

What technology does the JRP series coating machine use?

The JRP series coating machine utilizes advanced Plasma-Enhanced Chemical Vapor Deposition (PECVD) vacuum deposition technology to apply various high-quality thin films onto flexible substrates.

What types of substrates can be processed with this machine?

It supports a wide range of flexible substrates, including organic thin films (such as PET, BOPP, PEN, PI, PC, PE), textile cloth, leather, and flexible metal foils.

What is the substrate width capacity of the JRP series?

The machine accommodates substrate widths ranging from 350mm up to 2050mm, offering excellent flexibility for various production requirements.

What kinds of thin films can be deposited?

The JRP series can deposit high barrier films such as SiO2 and Si3N4, as well as functional films like Diamond-Like Carbon (DLC) and Carbon (C).

What configuration options are available for the power supply and electrodes?

The system adopts either flat or roller electrodes and can be equipped with high voltage, Medium Frequency (MF), or Radio Frequency (RF) power supplies depending on the coating requirements.

How does the machine optimize operating costs and efficiency?

It features an energy-efficient design, automated controls for seamless operation, and high-performance components (like brand-name molecular or diffusion pumps) that minimize energy consumption and maintenance overhead.