China PECVD Roll to Roll Coating Machine - Leading Suppliers and Factory for Efficient Coating Solutions
Machine Brief Description
JRP serial PECVD roll to roll coating machine is a roll to roll vacuum coating machine adopts plasma to enhanced chemical vapor deposition (PECVD) to deposit various films.
One of the outstanding features of the JRP series PECVD machines is its advanced plasma technology. Through an enhanced chemical vapor deposition process, it achieves optimal film properties, including improved adhesion, uniformity and density. The resulting film not only meets but exceeds industry standards, giving your product a competitive advantage.
A user-friendly interface and automated controls make operation seamless, allowing for quick adjustments and real-time monitoring of the coating process. Additionally, the machine is designed with energy efficiency in mind, reducing operating costs while minimizing environmental impact.
Machine Brief Description
Stable in quality, large loading capacity
Fast coating speed, good film uniformity and adhesion.
To form film on flexible rolling substrates by PECVD.
Optimized design, easy to operate and do maintenance.
It adopts flat or roller electrode, equipped with high voltage, MF or RF power supply.
Substrate width range from 350mm to 2050mm.
Low operating costs.
Technical Parameter
| Serial | JRP |
| Technology | PECVD vacuum deposition |
| Chamber size | Coating chamber can be designed upon different request |
| Substrate Material | Organic thin film such as PET / BOPP / PEN / PI / PC / PE, Textile cloth, Leather, Flexible substrates such as metal foil; |
| Substrate width range | 350mm - 2050mm |
| Coating film | High barrier film such as SiO2, Si3N4 or functional film such as DLC, C; |
| Vacuum system | Vacuum system select international famous brand or China famous brand molecular pumps (or diffusion pumps), polycold, mechanical pumps, etc. |
Frequently Asked Questions
What deposition technology does the JRP series coating machine use?
The JRP series roll to roll coating machine utilizes advanced Plasma Enhanced Chemical Vapor Deposition (PECVD) technology in a vacuum environment to deposit various thin films.
What types of substrates can be coated with this PECVD system?
The machine is compatible with flexible substrates including organic thin films (PET, BOPP, PEN, PI, PC, PE), textile cloths, leather, and metal foils.
What are the width ranges supported for flexible substrates?
The JRP series PECVD coating machine can accommodate substrate widths ranging from 350mm to 2050mm.
What kinds of thin films can be deposited?
It is capable of depositing high barrier films such as SiO2 and Si3N4, as well as functional films like Diamond-Like Carbon (DLC) and Carbon (C).
What options are available for the vacuum system configuration?
The vacuum system can be configured with international or leading Chinese brands of molecular pumps, diffusion pumps, polycold systems, and mechanical pumps depending on specific requirements.
