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China PECVD Roll to Roll Coating Machine - High-Quality Suppliers and Factory Solutions for Efficient Coating

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Machine Brief Description

JRP serial PECVD roll to roll coating machine is a roll to roll vacuum coating machine adopts plasma to enhanced chemical vapor deposition (PECVD) to deposit various films.

One of the outstanding features of the JRP series PECVD machines is its advanced plasma technology. Through an enhanced chemical vapor deposition process, it achieves optimal film properties, including improved adhesion, uniformity and density. The resulting film not only meets but exceeds industry standards, giving your product a competitive advantage.

A user-friendly interface and automated controls make operation seamless, allowing for quick adjustments and real-time monitoring of the coating process. Additionally, the machine is designed with energy efficiency in mind, reducing operating costs while minimizing environmental impact.

Machine Brief Description

Stable in quality, large loading capacity
Fast coating speed, good film uniformity and adhesion.
To form film on flexible rolling substrates by PECVD.
Optimized design, easy to operate and do maintenance.
It adopts flat or roller electrode, equipped with high voltage, MF or RF power supply.
Substrate width range from 350mm to 2050mm.
Low operating costs.

Technical Parameter

Serial	JRP
Technology	PECVD vacuum deposition
Chamber size	Coating chamber can be designed upon different request
Substrate Material	Organic thin film such as PET / BOPP / PEN / PI / PC / PE, Textile cloth, Leather, Flexible substrates such as metal foil
Substrate width range	350mm - 2050mm
Coating film	High barrier film such as SiO2, Si3N4 or functional film such as DLC, C
Vacuum system	Vacuum system select international famous brand or China famous brand molecular pumps (or diffusion pumps), polycold, mechanical pumps, etc.

Frequently Asked Questions

What technology does the JRP series coating machine use?

The JRP series utilizes Plasma-Enhanced Chemical Vapor Deposition (PECVD) vacuum deposition technology to apply various high-quality thin films onto flexible substrates.

What are the advantages of the PECVD process in this machine?

The PECVD process achieves optimal film properties, including significantly improved adhesion, film uniformity, and density, which helps products exceed standard industry requirements.

What types of substrates can be coated?

It is compatible with organic thin films (such as PET, BOPP, PEN, PI, PC, PE), textile cloths, leathers, and flexible metal foils.

What kinds of coating films can this machine deposit?

The system is capable of depositing high-barrier films like SiO2 and Si3N4, as well as functional coatings such as Diamond-Like Carbon (DLC) and Carbon (C) films.

Can the machine's chamber size and substrate width be customized?

Yes, the coating chamber can be custom-designed based on specific requests, and the machine supports a wide substrate width range from 350mm to 2050mm.

What components are used in the vacuum system?

The vacuum system incorporates internationally or domestically famous brands of molecular pumps (or diffusion pumps), polycold systems, and mechanical pumps to ensure reliable operation.