China Multi-Chamber Roll-to-Roll Coating Machine Suppliers | High-Performance Coating Factory for Complex Films
Machine Brief Description
Product Features
The machine can be equipped with planar or rotating sputtering cathode according different customer requirement
Can be configured with rotating or flat sputtering cathode;
It can be equipped with DC or MF power supply used for reactive sputtering;
Double-roller multi-chamber equipment can be up to 12 target positions, max can be installed 24 cathodes, that can realize higher efficiency;
The coating chamber is well partitioned, which is suitable for multi layer coating process;
Large production capacity, strong stability, good repeatability and low operation cost.
Technical Parameter
| Serial | JRC |
| Technology | Sputtering Technology |
| Chamber size | Can be designed upon different request |
| Substrate Material | PET, BOPP, PEN, PI, PC, PE, and other organic films. Fiber cloth, tissue roll, foam, metal rolling material, flexible material such as ultra-thin glass |
| Coating film | Cu, Ag, Cr, Ni, Au, Mo, Si, ITO |
| Application | Lithium battery composite copper foil, FCCL (flexible copper clad laminate) Transparent conductive cloth, Electromagnetic shielding film, Solar cell absorption layer, electrode layer, Barrier film, heat dissipation film, high reflective film |
Frequently Asked Questions (FAQ)
What types of substrates are compatible with this roll-to-roll coating machine?
This system supports a wide range of substrate materials, including organic films such as PET, BOPP, PEN, PI, PC, and PE, as well as fiber cloth, tissue rolls, foam, metal rolling materials, and flexible materials like ultra-thin glass.
How many cathodes can be installed in this coating equipment?
Depending on your production requirements, the single-roller multi-chamber configuration can install up to 12 cathodes (6 target positions), while the double-roller multi-chamber system can accommodate up to 24 cathodes (12 target positions).
What kinds of thin films can be coated using this machine?
The JRC sputtering system is capable of depositing various high-performance films, including Copper (Cu), Silver (Ag), Chromium (Cr), Nickel (Ni), Gold (Au), Molybdenum (Mo), Silicon (Si), and Indium Tin Oxide (ITO).
Which power supplies are supported for reactive sputtering?
The machine can be configured with either DC (Direct Current) or MF (Medium Frequency) power supplies to meet different reactive sputtering process specifications.
What are the main industrial applications of this sputtering system?
Key applications include lithium battery composite copper foil, FCCL (flexible copper clad laminate), transparent conductive cloth, electromagnetic shielding films, solar cell absorption and electrode layers, barrier films, heat dissipation films, and high reflective films.
How does the multi-chamber design benefit multi-layer coating?
The coating chamber is well partitioned to prevent cross-contamination between different target zones, making it highly suitable for complex, high-quality multi-layer film structures or thick film coatings.





