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China Multi-Chamber Roll-to-Roll Coating Machine Supplier - High Performance & Factory Direct

Introducing our advanced roll-to-roll coating equipment, specially designed for high-performance coatings in multiple layers or high-speed applications. As a leading manufacturer in China, our factory offers cutting-edge solutions for complex film and thick film coating. Our innovative equipment features options including single roller multiple chambers with 6 cathode target positions (capable of accommodating up to 12 cathodes) and double rollers multiple chambers with 12 cathode target positions (supporting up to 24 cathodes). This versatile machinery is ideal for suppliers looking to enhance their production capabilities with efficient and effective coating technologies. Optimize your manufacturing process and achieve superior results with our state-of-the-art coating systems

Machine Brief Description

It is a continuous roll-to-roll coating equipment which specially developed for high performance multiple layers products coating or high speed coating. There are single roller multiple chambers or double rollers multiple chambers. The single roller multiple chambers equipped with 6 cathode target positions, up to install 12 pieces cathodes. The double rollers multiple chambers can have 12 cathodes target positions, up to install 24 pieces cathodes. It can achieve multiple layers complex film or thick film coating. The multi-chamber vacuum sputtering roll-to-roll coating machine with more target positions. Its innovative features not only improve production efficiency but also ensure high-quality output, making it an essential tool for modern manufacturing processes.

Product Feature

The machine can be equipped with planar or rotating sputtering cathode according to different customer requirements.

Can be configured with rotating or flat sputtering cathode.

It can be equipped with DC or MF power supply used for reactive sputtering.

Double-roller multi-chamber equipment can be up to 12 target positions, max can be installed 24 cathodes, realizing higher efficiency.

The coating chamber is well partitioned, which is suitable for multi-layer coating processes.

Large production capacity, strong stability, good repeatability, and low operation cost.

Technical Parameter

Parameter Item	Specifications & Details
Serial	JRC
Technology	Sputtering Technology
Chamber size	Can be designed upon different request
Substrate Material	PET, BOPP, PEN, PI, PC, PE, and other organic films. Fiber cloth, tissue roll, foam, metal rolling material, flexible material such as ultra-thin glass
Coating film	Cu, Ag, Cr, Ni, Au, Mo, Si, ITO
Application	Lithium battery composite copper foil, FCCL (flexible copper clad laminate), Transparent conductive cloth, Electromagnetic shielding film, Solar cell absorption layer, electrode layer, Barrier film, heat dissipation film, high reflective film

Frequently Asked Questions

What is the roll-to-roll coating equipment primarily used for?

It is a continuous roll-to-roll coating system specifically developed for high-performance multiple layers products coating or high-speed coating. Typical applications include lithium battery composite copper foil, FCCL, electromagnetic shielding films, and solar cell layers.

How many cathodes can be installed in this sputtering system?

The configuration depends on the model: the single roller multiple chambers system can install up to 12 cathodes (6 target positions), while the double rollers multiple chambers system can accommodate up to 24 cathodes (12 target positions) for maximum efficiency.

What types of substrate materials can be processed?

The equipment is highly versatile and compatible with PET, BOPP, PEN, PI, PC, PE, and other organic films. It also supports fiber cloth, tissue roll, foam, metal rolling materials, and flexible materials like ultra-thin glass.

What coating materials can be deposited using this machine?

It is designed to deposit a wide variety of thin films, including Copper (Cu), Silver (Ag), Chromium (Cr), Nickel (Ni), Gold (Au), Molybdenum (Mo), Silicon (Si), and Indium Tin Oxide (ITO).

Can the sputtering cathodes and power supplies be customized?

Yes. The machine can be configured with either planar/flat or rotating sputtering cathodes based on project specifications. Additionally, it supports both DC and MF power supplies for reactive sputtering processes.

What are the main operational advantages of this multi-chamber coating machine?

The system features a well-partitioned coating chamber ideal for complex multi-layer coatings. It offers large production capacity, exceptional stability, excellent repeatability, and a low overall operational cost.