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China JRC Series Single Vacuum Chamber Sputtering Roll to Roll Coating Machine - Suppliers and Factory Direct
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China JRC Series Single Vacuum Chamber Sputtering Roll to Roll Coating Machine - Suppliers and Factory Direct

The JRC series sputtering roll coater represents a cutting-edge solution in the realm of vacuum metallizing machines, specifically designed for roll-to-roll applications. Manufactured in China, this compact machine integrates an advanced winding and coating system within a single chamber, showcasing a high degree of automation tailored to meet diverse production needs. As a leading supplier and factory of sputtering technology, we offer customizable sizes based on varying product widths, This versatile machine is capable of depositing a variety of conductive films, including copper (Cu), silver (Ag), chromium (Cr), nickel (Ni), gold (Au), molybdenum (Mo), silicon (Si), indium tin oxide (ITO), and carbon (C). Additionally, it supports the coating of alloy films such as nickel-chromium (NiCr), nickel-copper (NiCu), and indium-tin (InSn). Furthermore, the JRC series can also apply dielectric films like silicon dioxide (SiO2), niobium pentoxide (Nb2O5), aluminum oxide (Al2O3), chromium oxide (CrO), and titanium dioxide (TiO2), Choose our JRC series sputtering roll coater for reliable performance and exceptional coating quality, backed by the expertise of one of the top suppliers and factories in China

    Single vacuum chamber sputtering roll to roll coating machine

    JRC series sputtering roll coater is a type of compact roll to roll vacuum metallizing machine, winding system and coating system installed in the same chamber, high degree of automation. The size can be designed according different width products.
    • It can coat Cu, Ag, Cr, Ni, Au, Mo, Si, ITO, C, etc conductive film.
    • It can coat NiCr, NiCu, InSn, etc alloy film.
    • It also can coat SiO2, Nb2O5, Al2O3, CrO, TiO2 film.
    The machine can realize double-sided copper sputtering on the surface of PET/PP or other flexible material with a thickness of 3.0~4.5μm and a width of 600~1650mm at one time, with a "PVD copper-polymer support layer-PVD copper" sandwich structure, and the machine process speed is 0.5 -30m/min.

    Product Feature

    The machine can be equipped with planar or rotating sputtering cathode according different customer requirement.

    The machine can achieve single side or both sides coating on substrate surface depend on coating process of different products.

    The machine requires less area occupied, favourable in price, easy to operate.

    The metallized film is very stable and the film layer has good density. Large capacity and output.

    Technical Parameter

    Serial JRC
    Technology Microwave sputtering
    Substrate Material PET, BOPP, PEN, PI, PC, PE, and other organic films. Fiber cloth, tissue roll, foam, metal rolling material, flexible material such as ultra-thin glass
    Coating film Cu, Ag, Cr, Ni, Au, Mo, Si, ITO
    Application Lithium battery composite copper foil,
    FCCL (flexible copper clad laminate)
    Transparent conductive cloth,
    Electromagnetic shielding film,
    Solar cell absorption layer, electrode layer,
    Barrier film, heat dissipation film, high reflective film

    Frequently Asked Questions

    What types of films can the JRC series sputtering roll coater deposit?

    The machine is highly versatile and can coat conductive films (such as Cu, Ag, Cr, Ni, Au, Mo, Si, ITO, C), alloy films (including NiCr, NiCu, InSn), and other oxide films like SiO2, Nb2O5, Al2O3, CrO, and TiO2.

    What flexible substrates are compatible with this machine?

    It is compatible with a wide range of flexible materials, including organic films (PET, BOPP, PEN, PI, PC, PE), fiber cloth, tissue rolls, foam, metal rolling materials, and ultra-thin glass.

    Can the machine perform double-sided coating?

    Yes. Depending on your specific product process requirements, the machine can be configured to achieve either single-sided or double-sided coating on the substrate surface.

    What is the operating speed and thickness capability for copper sputtering?

    The machine can process double-sided copper sputtering on substrates with a thickness of 3.0~4.5μm and a width of 600~1650mm at a processing speed of 0.5 to 30 meters per minute.

    What are the primary industrial applications for this coater?

    Key applications include lithium battery composite copper foil, FCCL (flexible copper clad laminate), transparent conductive cloth, electromagnetic shielding films, solar cell layers (absorption and electrode), barrier films, heat dissipation films, and highly reflective films.

    What are the main design advantages of the JRC series?

    It features a compact single-chamber design where both the winding and coating systems are integrated. This results in a smaller footprint, highly automated operation, cost-effectiveness, and stable high-density film output.

    APPLICATION FIELDS

    1.Hardware surface
    2.Plastic decorative parts
    3.Glass lighting, auto parts, car wheels hub and other products;
    4.Cutting tools, tools, moulds and mechanical parts
    5.Mobile phone cases, home appliances, ornaments, etc.
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