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Multi-Chamber Sputtering Roll to Roll Coating Machine

It is a continuous roll-to-roll coating equipment which specially developed for high performance multiple layers products coating or high speed coating. There are single roller multiple chambers or double rollers multiple chambers. The single roller multiple chambers equipped with 6 cathode target positions, up to install 12 pieces cathodes. The double rollers multiple chambers can have 12 cathodes target positions, up to install 24 pieces cathodes. It can achieve multiple layers complex film or thick film coating.

    Machine Brief Description

    It is a continuous roll-to-roll coating equipment which specially developed for high performance multiple layers products coating or high speed coating. There are single roller multiple chambers or double rollers multiple chambers. The single roller multiple chambers equipped with 6 cathode target positions, up to install 12 pieces cathodes. The double rollers multiple chambers can have 12 cathodes target positions, up to install 24 pieces cathodes. It can achieve multiple layers complex film or thick film coating. The multi-chamber vacuum sputtering roll-to-roll coating machine with more target positions. Its innovative features not only improve production efficiency but also ensure high-quality output, making it an essential tool for modern manufacturing processes.

    product feature

    • . The machine can be equipped with planar or rotating sputtering cathode according different customer requirement
    • .  Can be configured with rotating or flat sputtering cathode;
    • . It can be equipped with DC or MF power supply used for reactive sputtering;
    • .  Double-roller multi-chamber equipment can be up to 12 target positions, max can be installed 24 cathodes, that can realize higher efficiency;
    • . The coating chamber is well partitioned, which is suitable for multi layer coating process;
    • .  Large production capacity, strong stability, good repeatability and low operation cost.

    TECHNICAL PARAMETER

    Serial

    JRC

    Technology

    Sputtering Technology

    Chamber size

    Can be designed upon different request

    Substrate Material

    PET,BOPP, PEN, PI, PC, PE, and other organic films. Fiber cloth, tissue roll, foam, metal rolling material, flexible material such as ultra-thin glass

    Coating film

    Cu, Ag, Cr, Ni, Au, Mo, Si, ITO

    Application

    Lithium battery composite copper foil,

    FCCL (flexible copper clad laminate)

    Transparent conductive cloth,

    Electromagnetic shielding film,

    Solar cell absorption layer, electrode layer,

    Barrier film, heat dissipation film, high reflective film

    APPLICATION FIELDS

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