ICP Magnetron Optical Coating Machine
Machine Brief Description
The ICP Magnetron Optical Coating Machine is a new type of high speed, high efficiency and high quality sputter deposited optical multilayer coating machine designed to meet the needs of the modern optical and electronics industry for high performance films. It combines Inductively Coupled Plasma (ICP) technology with magnetron sputtering principle, which is capable of efficiently and uniformly depositing high quality multilayer optical films on a variety of substrates to meet the needs of different applications. It is widely used in optical devices, electronics, semiconductors and decorative coatings.
product featured
- . Advanced ICP coating process of sputtering first and then ionisation can achieve higher deposition efficiency, better coating repeatability and better quality film layer, ensuring the optical performance and durability of the final product.
- . It can be designed as single chamber or multi-chamber structure according to the requirements, and equipped with automatic loading and unloading device to achieve higher production efficiency and lower operating costs.
- . If configured with evaporation coating system, it can also realise the preparation of AF/AS film.
- . Multi-layer film deposition capability, support for complex multi-layer film structure design, the ability to flexibly adjust the thickness of the film layer and the combination of materials according to customer needs, to meet different optical performance requirements.
- . Support for a variety of materials coating, including metal, oxide, nitride, etc., to adapt to different application requirements, to meet the diversified choices of customers.
- . Provide high-performance electrical insulation and conductive film in the semiconductor field, enhancing optical performance and durability in optical devices, as well as aesthetics and abrasion resistance in decorative coating, meeting the needs of high-tech products.
TECHNICAL PARAMETER
Series | CJX Series |
Technology | Magnetron sputtering followed by ionisation |
Chamber Size | Can be designed upon different request. |
Substrate Material | Glass lenses; Plastic sheet/sheet; |
Coating Film | AR; Supperhard AR; BBAR; High refletive film; UV/IR cutoff filter; Bandpass filter; Precise optical film such as color film; AF/AS;; |
Vacuum System | Vacuum system select international famous brand or China famous brand molecular pumps (or diffusion pumps), polycold, mechanical pumps, etc. |
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